Gas supply apparatus and film forming apparatus
US6224676A · kind A · utility
14Cited by
0References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 1, 1999 |
| Grant date | May 1, 2001 |
| Priority date | — |
| Expiry date | Dec 1, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
According to the present invention, a signal transmission system is arranged in a region surrounded by a gas control means and a plurality of blocks whereby a region between elements constituting a gas supply flow path can be utilized for the region of the signal transmission system thereby to make the occupying space small and miniaturize the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.