Target assembly for ion beam sputter deposition with multiple paddles each having targets on both sides
US6224718A · kind A · utility
25Cited by
15References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 14, 1999 |
| Grant date | May 1, 2001 |
| Priority date | — |
| Expiry date | Jul 14, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An ion beam sputtering target assembly has six sputter targets arranged in pairs on three paddles and disposed upon the circumference of a circular holder. The circular holder can be rotated about its axis in such a way as to bring any one of the target pairs to be exposed to the sputtering ion beam to deposit a film on substrate. The paddle is rotated to bring a desired target in the pair into position for sputtering. An alternative embodiment is provided with an enlarged region which allows one of the target paddles to be rotated about its axis while that target paddle is in an inactive, non-sputtering rotary position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.