Ozone-processing apparatus for semiconductor process system
US6224934A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2000 |
| Grant date | May 1, 2001 |
| Priority date | — |
| Expiry date | Jun 6, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B33/005
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An ozone-processing apparatus for a semiconductor process system includes an airtight process chamber and a lamp chamber, which are partitioned by a window for transmitting ultraviolet rays. A plurality of ultraviolet-ray lamps is arrayed along the window in the lamp chamber. A measurement space is defined between the window and the lamps in the lamp chamber. The lamp chamber is provided with a mount portion to set up a measuring unit therein. The measuring unit includes a sensor to be inserted into the measuring space, for measuring the light quantity of the lamps. The sensor is movable in a direction in which the lamps are arrayed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.