Electron beam exposure apparatus
US6225637A · kind A · utility
35Cited by
13References
70Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 20, 1997 |
| Grant date | May 1, 2001 |
| Priority date | — |
| Expiry date | Oct 20, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31767
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer via a reduction electron optical system, irradiates collimated electron beams toward an aperture board having an arcuated aperture sandwiched between two arcs having, as the center, the axis of the reduction electron optical system, and exposes the wafer with electron beams having an arcuated sectional shape that have been transmitted through the aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.