Plasma processing system
US6225746A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 21, 2000 |
| Grant date | May 1, 2001 |
| Priority date | — |
| Expiry date | Jan 21, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing reactor includes a helical resonator including a top plate and a helical coil, the helical coil is made of a metal with a length of .lambda./4, wherein n is an integer and .lambda. is a wavelength of rf frequency applied to the helical coil. The reactor also includes a plasma process chamber including a wafer holder arranged at a lower position therein and a wafer to be processed is loaded on the wafer holder. The helical resonator has a vertical bar for introducing a gas, the vertical bar is fixed to the top plate of the helical resonator and is connected to a gas inlet port. A partition wall separates the helical resonator and the plasma process chamber. The partition wall includes an outer metal ring, a circular central metal plate, and a doughnut-shaped dielectric plate between the outer metal ring and the central metal plate, the doughnut-shaped dielectric plate having an inner diameter and an outer diameter. The central metal plate is fixed to the top plate using the vertical bar and includes a gas reservoir and a plurality of gas inlet ports. The helical coil is placed around the vertical bar, and the helical coil has a diameter that is greater than the i…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.