Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devices
US6226074A · kind A · utility
20Cited by
9References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2000 |
| Grant date | May 1, 2001 |
| Priority date | — |
| Expiry date | Feb 22, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure monitor mask used with an exposure system for manufacturing ICs includes an exposure detecting pattern having at least three patterns arranged in one direction, the exposure detecting pattern including a pair of relative position detecting patterns with at least one variable intensity pattern that allows the intensity of light transmitted therethrough to vary monotonously in the one direction disposed between the pair of relative position detecting patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.