X-ray analysis apparatus with a graded multilayer mirror
US6226349A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 19, 1999 |
| Grant date | May 1, 2001 |
| Priority date | — |
| Expiry date | Jul 19, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/062
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An X-ray analysis apparatus having a curved paraboloid-shaped curved graded multilayer Bragg reflector (5) is characterized in that the layers of the reflector (5) are directly introduced onto a concave curved surface of a paraboloid-shaped hollow substrate and a maximum allowable shape deviation for the concave substrate surface facing the reflector is .DELTA.p=2px .DELTA..theta..sub.R, and having a maximum allowable waviness ##EQU1## and a maximum allowable roughness .DELTA.y=d/2.pi., preferentially .DELTA.y.ltoreq.0.3 nm, wherein the X radiation (7) impinges on the curved surface of the reflector (5) at an angle of incidence 0.degree.<.theta..ltoreq.5.degree. with the period thickness d of the reflector layer towards the paraboloid opening increasing in the x direction in accordance with ##EQU2## wherein the deviation .DELTA.d/.DELTA.x is less than d/(2x). In this fashion, the transmission of the analysis apparatus is substantially improved as is the reliability and the lifetime, with reduced manufacturing difficulty and expense.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.