Patent · US Expired

Synchronous multiplexed near zero overhead architecture for vacuum processes

US6228773A · kind A · utility

24Cited by
24References
45Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 14, 1998
Grant dateMay 8, 2001
Priority date
Expiry dateApr 14, 2018

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67745
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Workpieces, such as, semiconductor wafers, are continuously manufactured by repetitively alternately switching a common radio frequency power source between a plurality of downstream or in-chamber processing reactors and actively processing one workpiece in a vacuum in an operating one of the processing chambers while simultaneously executing with a robot at atmospheric pressure the overhead tasks relative to next processing another workpiece in the other processing chamber. The active processing of the workpieces in alternate chambers does not overlap, and the robot starts and completes all of its preparatory tasks during the active processing step during the time when a chamber's door is closed thereby providing virtual zero overhead. System architecture allows eliminating all redundant components other than the dual chambers which operate in parallel. For a modest cost increase for the second chamber throughput is trebled and overall costs significantly reduced. Preferred modes include switching a common microwave power source between the pair of processing chambers, pumping down with a common vacuum pump, and stabilizing the chamber pressure with a common throttle valve.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.