Patent · US Expired

Semiconductor device

US6229165A · kind A · utility

39Cited by
1References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 28, 1998
Grant dateMay 8, 2001
Priority date
Expiry dateAug 28, 2018

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F39/151

Abstract

This invention provides a semiconductor device including a silicon layer, an insulating layer formed on the silicon layer, a first semiconductor device formed on the insulating film to convert light into an electric signal, and a second semiconductor device formed on the insulating film, wherein a silicon region is formed in the silicon layer to shield the second semiconductor device from light, and a through hole extending through the silicon layer except for the silicon region to input light to the first semiconductor device is formed in that portion of the silicon layer corresponding to the lower portions of the first and second semiconductor devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.