Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
US6232417A · kind A · utility
55Cited by
9References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 12, 1997 |
| Grant date | May 15, 2001 |
| Priority date | — |
| Expiry date | Sep 12, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source. The polymer repeating units are polymerized from polycyclic monomers in the presence of single or multicomponent catalyst systems containing a Group VIII metal
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.