Lithographic projection apparatus with improved substrate holder
US6232615A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 29, 1999 |
| Grant date | May 15, 2001 |
| Priority date | — |
| Expiry date | Mar 29, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus comprising: PA1 a radiation system (7) for supplying a projection beam (25) of radiation; PA1 a mask table (5) provided with a mask holder (27) for holding a mask (29); PA1 a substrate table (1) provided with a substrate holder (17) for holding a substrate (19); PA1 a projection system (3) for imaging an irradiated portion of the mask (29) onto a target portion (35) of the substrate (19), the substrate holder (17) comprising a plate (2) having a face (4) which is provided with a matrix arrangement of protrusions (6), each protrusion (6) having an extremity (6') remote from the face (4) and being thus embodied that the said extremities (6') all lie within a single substantially flat plane (6") at a height H above the face (4), the substrate holder (17) further comprising a wall (8) which protrudes from the face (4), substantially encloses the matrix arrangement, and has a substantially uniform height h above the face (4), whereby h<H, the face (4) inside the wall (8) being provided with at least one aperture (10) extending through the plate (4) and through which the area enclosed by the wall (8) can be accessed, whereby: PA1 the matrix arrangement…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.