Vacuum treatment system and its stage
US6235146A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 1999 |
| Grant date | May 22, 2001 |
| Priority date | — |
| Expiry date | May 18, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/914
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A stage with an electrostatic attracting means is adapted for use in a wafer treatment at a high temperature in a vacuum treatment system. In a vacuum treatment system having a stage provided in a treatment chamber, which electrostatically attracts an object to the stage in a low pressure atmosphere, and treats the object at high temperature by heating the stage, an electrode member of the stage is made of titanium or a titanium alloy and a dielectric film for electrostatic attraction is formed on the electrode member. In order to bond firmly titanium and alumina ceramics, it is desirable to sandwich a nickel alloy (Ni--Al) between the materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.