Hironobu Kawahara
39Patents
14h-index
53Co-inventors
84Inventor score
Filing activity: Oct 19, 1987 → Oct 2, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4795529A | Plasma treating method and apparatus therefor | Electricity | 117 | Expired |
| US5007981A | Method of removing residual corrosive compounds by plasma etching followed by washing | Electricity | 91 | Expired |
| US5110408A | Process for etching | Electricity | 63 | Expired |
| US5556714A | Method of treating samples | Emerging Cross-Sectional Technologies | 60 | Expired |
| US5868854A | Method and apparatus for processing samples | Electricity | 53 | Expired |
| US4985113A | Sample treating method and apparatus | Electricity | 42 | Expired |
| US5200017A | Sample processing method and apparatus | Electricity | 31 | Expired |
| US5380397A | Method of treating samples | Emerging Cross-Sectional Technologies | 27 | Expired |
| US5861601A | Microwave plasma processing apparatus and method | Electricity | 25 | Expired |
| US6624084B2 | Plasma processing equipment and plasma processing method using the same | Electricity | 22 | Expired |
| US5320707A | Dry etching method | Electricity | 21 | Expired |
| US5770100A | Method of treating samples | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6427621B1 | Plasma processing device and plasma processing method | Electricity | 19 | Expired |
| US6677167B2 | Wafer processing apparatus and a wafer stage and a wafer processing method | Electricity | 16 | Expired |
| US6235146A | Vacuum treatment system and its stage | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6549393B2 | Semiconductor wafer processing apparatus and method | Electricity | 9 | Expired |
| US5900162A | Plasma etching method and apparatus | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6537415B2 | Apparatus for processing samples | Electricity | 8 | Expired |
| US6036816A | Apparatus for processing a sample having a metal laminate | Electricity | 7 | Expired |
| US6649021B2 | Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield | Electricity | 6 | Expired |
| US6537012B2 | Vacuum processing apparatus and a vacuum processing system | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6329298A | Apparatus for treating samples | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6077788A | Method and apparatus for processing samples | Electricity | 4 | Expired |
| US6537417B2 | Apparatus for processing samples | Electricity | 4 | Expired |
| US6388624B1 | Parallel-planar plasma processing apparatus | Electricity | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.