Method of testing the gate oxide in integrated DMOS power transistors and integrated device comprising a DMOS power transistor
US6236225A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 1, 1998 |
| Grant date | May 22, 2001 |
| Priority date | — |
| Expiry date | Apr 1, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2621
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of testing a DMOS power transistor that includes arranging a switch between low-voltage circuitry and the gate terminal of the DMOS power transistor, maintaining the switch in an open condition, applying a stress voltage to the gate terminal, testing the functionality of the DMOS power transistor, and, if the test has a positive outcome, short-circuiting the switch through zapping by fusing a normally-open fusible link. An integrated circuit device with DMOS transistor is provided that includes a gate terminal of the DMOS transistor coupled to a control element, a normally-open switch element coupled in series between the gate terminal and the control element and including two metallic regions with an insulating between them connected in parallel with the switch element and in series between the gate terminal and the control element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.