Patent · US Expired

Very stable excimer or molecular fluorine laser

US6243405A · kind A · utility

35Cited by
5References
59Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 18, 2000
Grant dateJun 5, 2001
Priority date
Expiry dateJan 18, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S3/134
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A technique of stabalizing during operation a gas mixture with a gas composition initially provided within a discharge chamber of an excimer or molecular fluorine gas discharge laser includes monitoring a temporal pulse shape of the laser beam and adjusting and/or determining the status of the gas mixture based on the monitored temporal pulse shape. The monitored temporal pulse shape is preferably compared with a reference temporal pulse shape. The difference or deviation between the monitored temporal pulse shape and a reference temporal pulse shape is calculated. The amount of and intervals between gas replenishment actions are determined based on the calculated deviation. The energy of the beam is also monitored and the driving voltage and gas actions are adjusted to stabilize the energy, energy stability and/or energy dose.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.