Substrate treatment device
US6244282A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 4, 1999 |
| Grant date | Jun 12, 2001 |
| Priority date | — |
| Expiry date | May 4, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A device for the treatment of substrates has a fluid container filled with a treatment fluid and at least one substrate receiving device. A lifting device is provided for lifting and lowering the at least one substrate receiving device out of and into the treatment fluid. The lifting device is arranged laterally at the container and has parts that are positioned above the container and the treatment fluid. A vapor suction device with a suction channel is provided for exhaustion of vapors in an area in which parts of the at least one lifting device are located above the treatment fluid. In the area above the treatment fluid, a plate is provided having an opening to which the suction channel is connected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.