Apparatus and method for wet cleaning or etching a flat substrate
US6247481A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 24, 1997 |
| Grant date | Jun 19, 2001 |
| Priority date | — |
| Expiry date | Jun 24, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for wet cleaning or etching of flat substrates comprising a tank with an inlet opening and outlet opening for said substrates. Said tank contains a cleaning liquid and is installed in a gaseous environment. At least one of the openings is a slice in a sidewall of the tank and is present below the liquid-surface. In the tank there may be a portion above the liquid filled with a gas with a pressure being lower than the pressure within said environment. The method comprises the step of transferring a substrate through the cleaning or etching liquid at a level underneath the surface of said liquid making use of said apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.