Method and apparatus for automated rework within run-to-run control semiconductor manufacturing
US6248602A · kind A · utility
72Cited by
10References
42Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 1, 1999 |
| Grant date | Jun 19, 2001 |
| Priority date | — |
| Expiry date | Nov 1, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides for a method and an apparatus for performing automated rework in a manufacturing process. A lot of semiconductor devices is processed using a first set of control input parameters. The first set of control input parameters is stored in a memory location. Process data from the processing of the lot of semiconductor devices is acquired. Errors in the process data are analyzed. At least one automated rework procedure is performed on the lot of semiconductor devices in response to the analysis of the process data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.