Christopher A. Bode
65Patents
18h-index
27Co-inventors
84Inventor score
Filing activity: Aug 10, 1999 → Apr 20, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6746308B1 | Dynamic lot allocation based upon wafer state characteristics, and system for accomplishing same | Electricity | 392 | Expired |
| US6248602A | Method and apparatus for automated rework within run-to-run control semiconductor manufacturing | Electricity | 72 | Expired |
| US6405096B1 | Method and apparatus for run-to-run controlling of overlay registration | Electricity | 64 | Expired |
| US6368883B1 | Method for identifying and controlling impact of ambient conditions on photolithography processes | Electricity | 60 | Expired |
| US6708075B2 | Method and apparatus for utilizing integrated metrology data as feed-forward data | Electricity | 57 | Expired |
| US6751518B1 | Dynamic process state adjustment of a processing tool to reduce non-uniformity | Electricity | 47 | Expired |
| US6410351B1 | Method and apparatus for modeling thickness profiles and controlling subsequent etch process | Electricity | 44 | Expired |
| US6778873B1 | Identifying a cause of a fault based on a process controller output | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6535774B1 | Incorporation of critical dimension measurements as disturbances to lithography overlay run to run controller | Electricity | 39 | Expired |
| US8321048B1 | Associating data with workpieces and correlating the data with yield data | Emerging Cross-Sectional Technologies | 39 | Expired |
| US6610550B1 | Method and apparatus for correlating error model with defect data | Electricity | 30 | Expired |
| US6650955B1 | Method and apparatus for determining a sampling plan based on process and equipment fingerprinting | Emerging Cross-Sectional Technologies | 27 | Expired |
| US7558687B1 | Method and apparatus for dynamic adjustment of a sensor sampling rate | Physics | 24 | Expired |
| US6810296B2 | Correlating an inline parameter to a device operation parameter | Electricity | 22 | Expired |
| US6687561B1 | Method and apparatus for determining a sampling plan based on defectivity | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6815232B2 | Method and apparatus for overlay control using multiple targets | Electricity | 20 | Expired |
| US6607926B1 | Method and apparatus for performing run-to-run control in a batch manufacturing environment | Electricity | 19 | Expired |
| US6871114B1 | Updating process controller based upon fault detection analysis | Physics | 19 | Expired |
| US6947803B1 | Dispatch and/or disposition of material based upon an expected parameter result | Electricity | 17 | Expired |
| US6615098B1 | Method and apparatus for controlling a tool using a baseline control script | Emerging Cross-Sectional Technologies | 17 | Expired |
| US6821792B1 | Method and apparatus for determining a sampling plan based on process and equipment state information | Physics | 15 | Expired |
| US6665623B1 | Method and apparatus for optimizing downstream uniformity | Physics | 15 | Expired |
| US6741903B1 | Method for relating photolithography overlay target damage and chemical mechanical planarization (CMP) fault detection to CMP tool indentification | Emerging Cross-Sectional Technologies | 14 | Expired |
| US7103439B1 | Method and apparatus for initializing tool controllers based on tool event data | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6528331B1 | Method for identifying and controlling impact of ambient conditions on photolithography processes | Electricity | 13 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.