Pre-treatment for salicide process
US6254739A · kind A · utility
5Cited by
3References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 13, 1999 |
| Grant date | Jul 3, 2001 |
| Priority date | — |
| Expiry date | Oct 13, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/022
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for treating a silicon substrate is described. The silicon substrate is placed into a sputtering equipment. A sputtering step is performed to simultaneously dry clean and amorphize the silicon substrate surface by using the sputtering equipment. A titanium film is deposited on the silicon substrate by the sputtering equipment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.