Device for the deposition of substances
US6258153A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 18, 1999 |
| Grant date | Jul 10, 2001 |
| Priority date | — |
| Expiry date | Jun 18, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S55/15
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The device enables the deposition of substances from a gas phase. The device has a deposition chamber with at least one inner wall that is maintained at a deposition temperature for the deposition of the substances. A delivery end of a feed line extends to or into the deposition chamber. The substances to be deposited in the deposition chamber are delivered in gas form via the feed line. The feed has a transport temperature above the deposition temperature. This transport temperature is selected such that premature deposition of the substances inside the feed is prevented. A thermal insulation is formed between the feed and the inner wall of the deposition chamber. Any cooling of the feed toward its delivery end down to the deposition temperature is thereby prevented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.