Zone controlled radiant heating system utilizing focused reflector
US6259072A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 1999 |
| Grant date | Jul 10, 2001 |
| Priority date | — |
| Expiry date | Nov 9, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A temperature control system (20, 22, 24) is provided for a plasma processing device (10). The plasma processing device (10) comprises a plasma generator (14) and a processing chamber (52) in communication with the plasma generator (14) such that plasma within the generator may pass into the chamber and react with the surface of a substrate (18) residing therein. The temperature control system (20, 22, 24) comprises (i) a radiant heater assembly (20) for heating the substrate (18), comprising a plurality of radiant heating elements (58) arranged in a plurality of zones (a-n), each zone comprising at least one heating element, and a focused reflector (56) for focusing radiant energy from the heating elements toward the substrate; (ii) a feedback mechanism (24) for providing a substrate temperature feedback signal (25); and (iii) a controller (22), including a P-I-D closed loop controller (80) and a lamp power controller (90). The P-I-D closed loop controller (80) receives a temperature setpoint signal and the temperature feedback signal and in response thereto independently adjusts a control variable sent to the lamp power controller. The power controller (90) then adjusts the power…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.