Axcelis Technologies, Inc.
🏢 View company profile →401Patents
224Active
401Granted
51Portfolio score
Filing activity: Aug 7, 1998 → Oct 4, 2023 · 107 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6756085B2 | Ultraviolet curing processes for advanced low-k materials | Electricity | 593 | Expired |
| US6576300B1 | High modulus, low dielectric constant coatings | Emerging Cross-Sectional Technologies | 553 | Expired |
| US6635117B1 | Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system | Electricity | 548 | Expired |
| US6759098B2 | Plasma curing of MSQ-based porous low-k film materials | Electricity | 545 | Expired |
| US6558755B2 | Plasma curing process for porous silica thin film | Electricity | 534 | Expired |
| US8071451B2 | Method of doping semiconductors | Electricity | 524 | Active |
| US6913796B2 | Plasma curing process for porous low-k materials | Emerging Cross-Sectional Technologies | 507 | Expired |
| US6225745A | Dual plasma source for plasma process chamber | Electricity | 447 | Expired |
| US6281135A | Oxygen free plasma stripping process | Emerging Cross-Sectional Technologies | 269 | Expired |
| US6237527A | System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate | Electricity | 230 | Expired |
| US6709807B2 | Process for reducing edge roughness in patterned photoresist | Emerging Cross-Sectional Technologies | 182 | Expired |
| US6101971A | Ion implantation control using charge collection, optical emission spectroscopy and mass analysis | Electricity | 91 | Expired |
| US7037846B2 | Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing | Electricity | 85 | Expired |
| US8227768B2 | Low-inertia multi-axis multi-directional mechanically scanned ion implantation system | Electricity | 75 | Active |
| US6548416B2 | Plasma ashing process | Electricity | 52 | Expired |
| US8422193B2 | Annulus clamping and backside gas cooled electrostatic chuck | Electricity | 49 | Active |
| US6761796B2 | Method and apparatus for micro-jet enabled, low-energy ion generation transport in plasma processing | Electricity | 48 | Expired |
| US6305316A | Integrated power oscillator RF source of plasma immersion ion implantation system | Electricity | 48 | Expired |
| US6782843B2 | Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system | Electricity | 47 | Expired |
| US6638875B2 | Oxygen free plasma stripping process | Emerging Cross-Sectional Technologies | 45 | Expired |
| US6768121B2 | Ion source having replaceable and sputterable solid source material | Electricity | 44 | Expired |
| US7476855B2 | Beam tuning with automatic magnet pole rotation for ion implanters | Electricity | 43 | Active |
| US6288403A | Decaborane ionizer | Electricity | 40 | Expired |
| US6242747A | Method and system for optimizing linac operational parameters | Electricity | 36 | Expired |
| US6259072A | Zone controlled radiant heating system utilizing focused reflector | Electricity | 32 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.