Mask image scanning exposure method
US6261728A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 19, 1998 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Oct 19, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70358
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A dynamic mask exposure system and method includes a support for a workpiece, a source of a beam of exposure radiation, and a transmissive dynamic phase-shifting mask with orthogonally arranged matrices of actuator lines and binary pixel units which are opaque or transparent as a function of control inputs to the actuator lines. The transmissive dynamic mask has a top surface and a bottom surface. A control system is connected to supply pixel control signals to the actuator lines of the transmissive dynamic mask to form a pattern of transparent regions and opaque regions. The beam is directed down onto the top surface of the mask. A workpiece and/or an image detection element for detecting a pattern of radiation projected thereon is located on the top surface of the support. The beam passes through the transparent regions and projects a pattern from the mask onto the support where the workpiece or onto the image detection element is to be located. In the case where the image detection element is the target, there are means for providing signals representing the pattern to the control system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.