Antireflective coating compositions comprising photoacid generators
US6261743A · kind A · utility
59Cited by
11References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 1998 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Apr 10, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/128
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.