Stress adjustment method of X-ray mask
US6265113A · kind A · utility
325Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 16, 1998 |
| Grant date | Jul 24, 2001 |
| Priority date | — |
| Expiry date | Jul 16, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray absorber is deposited on a membrane. A stress adjust step is applied so that the average film stress of the X-ray absorber is 0. After patterning the X-ray absorber, the position accuracy of the pattern is measured. Then, a stress adjust process is applied to the patterned X-ray mask. Accordingly, a stress adjustment method is used to acquire an X-ray mask that has no pattern position offset of the X-ray absorber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.