Apparatus for cleaning items using gas plasma
US6267075A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 9, 1999 |
| Grant date | Jul 31, 2001 |
| Priority date | — |
| Expiry date | Jul 9, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67028
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma cleaning apparatus for cleaning lead frames or other items comprised of a chamber adapted for containing a plasma, a magazine positioned in the chamber for holding the lead frames, a first active electrode positioned in the chamber on one side of the magazine and a second active electrode positioned in the chamber on the other side of the magazine. A first grounded electrode is positioned between the first active electrode and the magazine and a second grounded electrode is positioned between the second active electrode and the magazine. The magazine is held at the same voltage as the first and second active electrodes and a plasma is generated which extends from the first active electrode to the second active electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.