Spin-on glass anti-reflective coatings for photolithography
US6268457A · kind A · utility
115Cited by
22References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 1999 |
| Grant date | Jul 31, 2001 |
| Priority date | — |
| Expiry date | Jun 10, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths less than 260 nm such as 248 nm and 193 nm, that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.