Liquid feed vaporization system and gas injection device
US6269221A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2000 |
| Grant date | Jul 31, 2001 |
| Priority date | — |
| Expiry date | Sep 15, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4557
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO.sub.3, SrTiO.sub.3 and other such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing effects of the vaporizer section to the liquid feed within the vaporization prevention section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.