Patent · US Expired

Single component developer for copolymer resists

US6270949A · kind A · utility

3Cited by

13References

6Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Thomas B. Faure · Saint Albans, US
Steven Flanders · Colchester, US
James P. Levin · Jericho, US
Harold G. Linde · South Burlington, US
Jeffrey F. Shepard · Vergennes, US

Key dates

Filing date	Apr 11, 2000
Grant date	Aug 7, 2001
Priority date	—
Expiry date	Apr 11, 2020

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/325
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for developing copolymer photosensitive resists wherein a single solvent is used in conjunction with a puddle develop tool. The copolymer resist is ZEP 7000 and the developer is ethyl 3-ethoxy propionate (EEP).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.