James P. Levin
10Patents
4h-index
19Co-inventors
57Inventor score
Filing activity: Jun 7, 1982 → Apr 8, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5149974A | Gas delivery for ion beam deposition and etching | Electricity | 32 | Expired |
| US4388386A | Mask set mismatch | Physics | 19 | Expired |
| US5159170A | Grid structure for reducing current density in focussed ion beam | Performing Operations; Transporting | 4 | Expired |
| US6777137B2 | EUVL mask structure and method of formation | Physics | 4 | Expired |
| US6270949A | Single component developer for copolymer resists | Physics | 3 | Expired |
| US7754394B2 | Method to etch chrome for photomask fabrication | Physics | 2 | Active |
| US6426177B2 | Single component developer for use with ghost exposure | Physics | 0 | Expired |
| US9372394B2 | Test pattern layout for test photomask and method for evaluating critical dimension changes | Physics | 0 | Active |
| US9989843B2 | Test pattern layout for test photomask and method for evaluating critical dimension changes | Physics | 0 | Active |
| US9996000B2 | Test pattern layout for test photomask and method for evaluating critical dimension changes | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.