Voltage controlled resistance modulation for single event upset immunity
US6271568A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 1997 |
| Grant date | Aug 7, 2001 |
| Priority date | — |
| Expiry date | Dec 29, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C11/4125
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An SRAM cell includes six transistors and two variable resistors. A first pair of transistors form a first inverter, while a second pair of transistors form a second inverter. The remaining two transistors are pass transistors. The inverters are cross-coupled, through the variable resistors, to form a flip flop circuit which stores binary logic states. The variable resistors are formed by doping a portion of a polysilicon layer. Above the doped polysilicon resistor is a thin oxide layer. Disposed above the oxide layer is a thin layer of aluminum or polysilicon, which is connected by metallization. When a positive voltage is applied to the metallization, electrons accumulate in the doped polysilicon resistor, thereby lowering the resistance value of the polysilicon region. This voltage is applied to the interconnect during a write-in cycle, when it is desired to write data to the SRAM cell. The lowered resistance value of the polysilicon resistor allows for relatively fast write-in times for the SRAM cell. At all other times, no voltage is applied to the interconnect. As such, the resistance value of the doped resistor polysilicon region remains at a relatively high value, thereby p…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.