Spiral chuck
US6271676A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 2, 1999 |
| Grant date | Aug 7, 2001 |
| Priority date | — |
| Expiry date | Mar 2, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/11
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A chuck is provided for holding a semiconductor wafer using a suction force. The chuck includes a chuck plate and may further include a manifold plate, and a seal plate to form a laminated chuck configuration. The chuck plate is disposed about a first axis and includes a first contact region disposed on a first side. The chuck plate further includes a first groove within the first contact region extending generally spirally outwardly from a first location proximate to the first axis to a second location within the first contact region. The chuck plate further includes a first plurality of vacuum holes extending from the first groove into the first side of the chuck plate. A method is provided for a probing a test pad on a semiconductor die disposed on a semiconductor wafer and removing an oxide layer disposed on the test pad. A probe needle contacts the test pad and is overdriven less than or equal to 1 micron into the test pad. The chuck holding the semiconductor wafer is moved in four substantially linear movements defining a substantially quadrangular area wherein each side of the quadrangular area is less than or equal to 1 micron in length, to remove the oxide layer from the t…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.