Apparatus for the treatment of exhaust gases by combining hydrogen and oxygen
US6274098A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 5, 1999 |
| Grant date | Aug 14, 2001 |
| Priority date | — |
| Expiry date | Jan 5, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D53/8671
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for the treatment of exhaust gases containing hydrogen which permits always stable treatment with certainty of the exhaust gases from a semiconductor manufacturing line or the like irrespective of violent fluctuations in the flow rate of the exhaust gases, without having adverse effects on the operation of the semiconductor manufacturing line. The apparatus comprises: an ejector-type vacuum generator having a suction port connected to the discharge source of exhaust gases containing hydrogen and having a drive fluid supply port connected to an oxygen supply source, a hydrogen-oxygen reactor provided with a catalyst and connected to a drive fluid discharge port of the vacuum generator, and a drain reservoir connected to an outlet of the reactor for storing water discharged therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.