Yoshikazu Tanabe
56Patents
14h-index
49Co-inventors
84Inventor score
Filing activity: Feb 17, 1989 → Apr 10, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5670808A | Metal oxide capacitor with a WN.sub.X electrode | Electricity | 40 | Expired |
| US6197702A | Fabrication process of a semiconductor integrated circuit device | Electricity | 33 | Expired |
| US6323115A | Method of forming semiconductor integrated circuit device with dual gate CMOS structure | Electricity | 32 | Expired |
| US6593229B1 | Semiconductor integrated circuit device and method for manufacturing the same | Electricity | 31 | Expired |
| US4932567A | Container for foamy liquid discharged in small amounts | Performing Operations; Transporting | 29 | Expired |
| US6066508A | Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process | Emerging Cross-Sectional Technologies | 26 | Expired |
| US5929473A | MMIC semiconductor device with WN.sub.x capacitor electrode | Electricity | 25 | Expired |
| US6894302B2 | Surface inspection apparatus and method thereof | Physics | 21 | Expired |
| US6093662A | Method for generating water for semiconductor production | Chemistry; Metallurgy | 20 | Expired |
| US6239041A | Method for fabricating semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 19 | Expired |
| US7247921B2 | Semiconductor apparatus and method of manufacturing same, and method of detecting defects in semiconductor apparatus | Electricity | 17 | Expired |
| US6503819B2 | Fabrication process of a semiconductor integrated circuit device | Electricity | 16 | Expired |
| US6784116B2 | Fabrication process of a semiconductor integrated circuit device | Electricity | 15 | Expired |
| US6737341B1 | Semiconductor integrated circuit device and method for manufacturing the same | Electricity | 15 | Expired |
| US7084708B2 | High-frequency amplification device | Electricity | 11 | Expired |
| US6180067A | Reactor for the generation of water | Chemistry; Metallurgy | 11 | Expired |
| US6733732B2 | Reactor for generating moisture | Chemistry; Metallurgy | 11 | Expired |
| US6274098A | Apparatus for the treatment of exhaust gases by combining hydrogen and oxygen | Performing Operations; Transporting | 11 | Expired |
| US6334962B1 | Low flow rate moisture supply process | Chemistry; Metallurgy | 11 | Expired |
| US6569780B2 | Method for fabricating semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6528431B2 | Method for fabricating semiconductor integrated circuit drive using an oxygen and hydrogen catalyst | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6521550B2 | Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6403475B1 | Fabrication method for semiconductor integrated device | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6528403B2 | Fabrication process of a semiconductor integrated circuit device | Electricity | 7 | Expired |
| US8517591B2 | Liquid crystal display device | Physics | 6 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.