Patent · US Expired

Field effect transistor of SiC for high temperature application, use of such a transistor and a method for production thereof

US6278133A · kind A · utility

9Cited by
6References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 23, 1999
Grant dateAug 21, 2001
Priority date
Expiry dateApr 23, 2019

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/106
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A field effect transistor of SiC for high temperature application has the source region layer (4), the drain region layer (5) and the channel region layer (6, 7) vertically separated from a front surface (14), where a gate electrode (12) is arranged, for reducing the electric field at said surface in operation of the transistor and in the case of operation as a gas sensor permitting all electrodes except for the gate electrode to be protected from the atmosphere.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.