Field effect transistor of SiC for high temperature application, use of such a transistor and a method for production thereof
US6278133A · kind A · utility
9Cited by
6References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 23, 1999 |
| Grant date | Aug 21, 2001 |
| Priority date | — |
| Expiry date | Apr 23, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/106
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A field effect transistor of SiC for high temperature application has the source region layer (4), the drain region layer (5) and the channel region layer (6, 7) vertically separated from a front surface (14), where a gate electrode (12) is arranged, for reducing the electric field at said surface in operation of the transistor and in the case of operation as a gas sensor permitting all electrodes except for the gate electrode to be protected from the atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.