Alignment method and apparatus therefor
US6278957A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 1999 |
| Grant date | Aug 21, 2001 |
| Priority date | — |
| Expiry date | Feb 1, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7003
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of aligning each of a plurality of processing areas arranged on a substrate with a predetermined transfer position in a static coordinate system XY for defining a moving position of said substrate, a pattern of a mask being transferred to each of the plurality of processing areas, the method comprising the steps of: wherein each of the plurality of processing areas has a specific point and a plurality of marks for alignment arranged by a predetermined positional relationship with respect to said specific point; measuring coordinate positions of a predetermined number of marks selected from several processing areas of the plurality of processing areas on the static coordinate system XY; calculating a plurality of parameters in a model equation expressing the regularity of arrangement of the plurality of processing areas by performing a statistic calculation by use with the measured plurality of coordinate positions, arrangement coordinate values upon the design of the specific points of the several processing areas and relative arrangement coordinate values upon the design of the selected marks of the several processing areas with respect to corresponding the specific point…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.