Air manager apparatus and method for exhausted equipment and systems, and exhaust and airflow management in a semiconductor manufacturing facility
US6280507A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 29, 2000 |
| Grant date | Aug 28, 2001 |
| Priority date | — |
| Expiry date | Feb 29, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S55/29
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An air manager for the containment of hazardous fumes over a liquid chemical tank in exhausted equipment and systems in a clean room. A powered, filtered airflow source forces filtered air through a plenum coextensive with a transverse dimension of the chemical tank, in a sheet-like airflow stream over the liquid surface. The airflow is captured at the opposite side of the liquid chemical tank and directed to a powered exhaust. The air manager works cooperatively with the clean room laminar airflow, dramatically increasing the efficiency of the local exhaust. Critical Capture Velocity over the entire surface of the tank is maintained, assuring complete containment of chemical fumes. Optional airflow guides positioned along the sides of the chemical tank may be employed to confine the air stream to the area over the liquid surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.