Patent · US Expired

Quartz glass crucible for pulling silicon single crystal and production process for such crucible

US6280522A · kind A · utility

9Cited by
1References
19Claims
0Family size

Assignees

Inventors

Key dates

Filing dateMar 29, 2000
Grant dateAug 28, 2001
Priority date
Expiry dateMar 29, 2020

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S65/08
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

There is provided a quartz glass crucible for pulling a silicon single crystal and a production process for the crucible, wherein an inner surface of the crucible is crystallized without addition of impurities during pulling a silicon single crystal, thereby impurities serving as causes of crystal defects being not incorporated into the silicon single crystal, so that deterioration of its inner surface is suppressed to improve a crystallization ratio, and accordingly productivity of the quartz glass crucible as well as a quality of the silicon single crystal is improved, and the quartz glass crucible for pulling a silicon single crystal comprises a crucible base body (3) made of a translucent quartz glass layer and a synthetic quartz glass layer (4) formed on an inner wall surface of the crucible base body (3), wherein a portion encircled by a brown ring on an inner surface of the quartz glass crucible is uniformly crystallized during pulling the silicon single crystal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.