Method of forming film of ultrafine particles
US6280802A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 1999 |
| Grant date | Aug 28, 2001 |
| Priority date | — |
| Expiry date | Jul 26, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C24/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a film of ultrafine particles includes the steps of accelerating ultrafine particles within a vacuum chamber to cause them to collide with a substrate and be deposited, and, at least before said ultrafine particles collide with said substrate, irradiating the ultrafine particles and the substrate with an ionic, atomic or molecular beam or low-temperature plasma or other high-speed, high-energy beam of high-energy atoms or molecules, whereby the surfaces of the ultrafine particles and substrate are activated without being fused, thus promoting bonding between said ultrafine particles and substrate or between the ultrafine particles to form a dense deposit that has good film properties and good adhesion to the substrate while maintaining the crystal properties of the ultrafine particles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.