Positive working photoresist compositions comprising a nitrogen-containing cyclic compound
US6280902A · kind A · utility
2Cited by
5References
7Claims
0Family size
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Key dates
| Filing date | Jun 1, 2000 |
| Grant date | Aug 28, 2001 |
| Priority date | — |
| Expiry date | Jun 1, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive working photoresist composition is provided which comprises a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid; an acid generator; and a nitrogen-containing cyclic compound represented by the following formula (I): ##STR1## PA1 wherein X represents CH.sub.2 or C(.dbd.O), two of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 represent a lower alkyl and the rest two represent hydrogen; PA1 gives a good profile with a smooth pattern side even on a substrate having a high reflection; and PA1 has a wide focus margin and a good sensitivity and resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.