Corrosion-resistant polishing pad conditioner
US6281129A · kind A · utility
23Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1999 |
| Grant date | Aug 28, 2001 |
| Priority date | — |
| Expiry date | Sep 20, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24D3/06
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention provides a method of manufacturing a semiconductor device using a polishing apparatus having a polishing pad conditioning wheel. In one embodiment, the polishing pad conditioning wheel comprises a conditioning head, a setting alloy, an abrasive material, and a corrosion resistant coating. The conditioning head has opposing first and second faces with the first face being coupleable to the polishing apparatus. The setting alloy is coupled to the conditioning head at the second face, and the abrasive material is embedded in the setting alloy, which is substantially covered by the corrosion resistant coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.