Method of producing flat panels
US6284106A · kind A · utility
24Cited by
3References
67Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 5, 2000 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Jun 5, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3325
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for producing flat panels for TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually isolated stationery bar-shaped target arrangements. A controlled magnet arrangement provided under each target with a time-varying magnetron field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.