Unaxis Trading Ltd
18Patents
0Active
18Granted
33Portfolio score
Filing activity: Sep 2, 1998 → Dec 5, 2005
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6916407B2 | Target comprising thickness profiling for an RF magnetron | Electricity | 31 | Expired |
| US6471837B1 | Vacuum coating installation and coupling device | Chemistry; Metallurgy | 28 | Expired |
| US6454920B1 | Magnetron sputtering source | Electricity | 27 | Expired |
| US6492011B1 | Wear-resistant workpiece and method for producing same | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6284106A | Method of producing flat panels | Electricity | 24 | Expired |
| US6427973B1 | Vacuum system with a vacuum plate valve | Mechanical Engineering; Lighting; Heating | 19 | Expired |
| US6454855B1 | Method for producing coated workpieces, uses and installation for the method | Electricity | 18 | Expired |
| US6918352B2 | Method for producing coated workpieces, uses and installation for the method | Electricity | 15 | Expired |
| US6827976B2 | Method to increase wear resistance of a tool or other machine component | Emerging Cross-Sectional Technologies | 15 | Expired |
| US6454908B1 | Vacuum treatment system | Electricity | 6 | Expired |
| US7067191B2 | Method to increase wear resistance of a tool or other machine component | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6879450B2 | Interference colored filters | Physics | 3 | Expired |
| US6676814B1 | Substrate coated with an MgO layer | Chemistry; Metallurgy | 3 | Expired |
| US6468703B1 | Method for producing a structure of interference colored filters | Physics | 3 | Expired |
| US6702901B2 | Chamber for chemical vapor deposition | Chemistry; Metallurgy | 2 | Expired |
| US6391112B1 | Heat-exchanging workholder for a vacuum unit | Electricity | 2 | Expired |
| US6706122B2 | Method for removing layers of hard material | Chemistry; Metallurgy | 2 | Expired |
| US7407084B2 | Method for mounting a semiconductor chip onto a substrate | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.