Method of manufacturing a flash memory cell having inter-poly-dielectric isolation
US6284598A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 23, 1999 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Nov 23, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B69/00
Abstract
A method of forming round corners for a gate oxide between a floating gate and a control gate of a memory cell comprises the steps of forming the floating gate over a tunnel oxide; forming a mask over the floating gate; forming rounded end caps adjacent distal ends of the mask; transferring the rounding of the end caps to top corners of the floating gate; forming the gate oxide over the floating gate; and, forming the control gate over the gate oxide. A memory cell having a rounded corner interface between the floating gate and control gate is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.