Patent · US Expired

Method of manufacturing a flash memory cell having inter-poly-dielectric isolation

US6284598A · kind A · utility

3Cited by
5References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 23, 1999
Grant dateSep 4, 2001
Priority date
Expiry dateNov 23, 2019

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10B69/00

Abstract

A method of forming round corners for a gate oxide between a floating gate and a control gate of a memory cell comprises the steps of forming the floating gate over a tunnel oxide; forming a mask over the floating gate; forming rounded end caps adjacent distal ends of the mask; transferring the rounding of the end caps to top corners of the floating gate; forming the gate oxide over the floating gate; and, forming the control gate over the gate oxide. A memory cell having a rounded corner interface between the floating gate and control gate is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.