Pattern generator for avoiding stitching errors
US6285488A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 31, 2000 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Aug 31, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N2201/0414
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The present invention relates to an apparatus for creating a pattern on a workpiece, such as a photomask, a semiconductor wafer, an electronic interconnect device, a printed circuit board, a display panel, a microoptical device or a printing plate, whereby a pattern with less visible edges is created. The apparatus comprises a source for emitting light pulses, a spatial modulator (SLM) having several pixels, a projection system, an electronic data delivery system, and a precision mechanical system moving said workpiece relative to said projection system. Further, it comprises an electronic control system coordinating the workpiece, the modulator and light sources, so that a large pattern is stitched together from the partial images created by the sequence of radiation pulses, where adjacent images being stitched together are overlapping at the common boundary, and the overlapping images have essentially the same pattern in the overlap region and a reduced light intensity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.