Electron beam lithography system having variable writing speed
US6288406A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1999 |
| Grant date | Sep 11, 2001 |
| Priority date | — |
| Expiry date | Mar 4, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The approach taken to provide variable writing speeds consists of the following: (1) Software in the Job Control subsystem that Identifies the minimum and maximum valid writing speeds, given the resist sensitivity, maximum beam current density, and requested write address size. if the variable writing speed option is enabled, Job Control selects the maximum valid speed. (2) Software in the Pattern Data Conversion subsystem that determines the number of stripes of pattern figure data to combine into each output bitmap for the selected writing speed. (3) Hardware in the Timing Logic Board to clock bitmap data to the serializer at the desired frequency. (4) Logic in the Blanking device to synchronize its blanking frequency with the clock rate used by the Timing Logic
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.