Antenna device for generating inductively coupled plasma
US6288493A · kind A · utility
57Cited by
10References
23Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | May 2, 2000 |
| Grant date | Sep 11, 2001 |
| Priority date | — |
| Expiry date | May 2, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to an antenna device of a low impedance for generating a large quantity of inductively coupled plasma to process a large size of a specimen with adjustment for a uniform distribution in the density of plasma, comprising: a high frequency power source; a first antenna for receiving the high frequency power supplied from the high frequency power source; and a second antenna connected in parallel with the first antenna for receiving the high frequency power supplied from the high frequency power source, wherein a resonant state is kept between the first and second antennas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.