JUSUNG ENGINEERING CO., LTD.
161Patents
112Active
161Granted
54Portfolio score
Filing activity: Aug 22, 1997 → Oct 24, 2023 · 41 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6884319B2 | Susceptor of apparatus for manufacturing semiconductor device | Electricity | 526 | Expired |
| US6634314B2 | Atomic layer deposition method and semiconductor device fabricating apparatus having rotatable gas injectors | Chemistry; Metallurgy | 68 | Expired |
| US6723595B2 | Thin film deposition method including using atomic layer deposition without purging between introducing the gaseous reactants | Chemistry; Metallurgy | 67 | Expired |
| US6288493A | Antenna device for generating inductively coupled plasma | Electricity | 57 | Expired |
| US7905960B2 | Apparatus for manufacturing substrate | Emerging Cross-Sectional Technologies | 27 | Expired |
| US6770836B2 | Impedance matching circuit for inductively coupled plasma source | Electricity | 20 | Expired |
| US6872421B2 | Atomic layer deposition method | Chemistry; Metallurgy | 17 | Expired |
| US6180542A | Method for forming a high-permittivity dielectric film use in a semiconductor device | Electricity | 16 | Expired |
| US6530993B2 | Cluster tool for fabricating semiconductor device | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6656284B1 | Semiconductor device manufacturing apparatus having rotatable gas injector and thin film deposition method using the same | Emerging Cross-Sectional Technologies | 15 | Expired |
| US6338995B1 | High-permittivity dielectric capacitor for a semiconductor device and method for fabricating the same | Electricity | 13 | Expired |
| US7943969B2 | Transistor with a plurality of layers with different Ge concentrations | Electricity | 12 | Active |
| US6847516B2 | Electrostatic chuck for preventing an arc | Electricity | 12 | Expired |
| US7442273B2 | Apparatus using hybrid coupled plasma | Electricity | 12 | Expired |
| US8097527B2 | Method of forming epitaxial layer | Electricity | 12 | Active |
| US10553406B2 | Plasma generating apparatus and substrate processing apparatus | Electricity | 12 | Active |
| US6769629B2 | Gas injector adapted for ALD process | Mechanical Engineering; Lighting; Heating | 11 | Expired |
| US7104476B2 | Multi-sectored flat board type showerhead used in CVD apparatus | Chemistry; Metallurgy | 10 | Expired |
| US7846292B2 | Gas injector and apparatus including the same | Chemistry; Metallurgy | 9 | Active |
| US6383953B2 | Apparatus for fabricating semiconductor device and method for fabricating semiconductor using the same | Electricity | 9 | Expired |
| US8702867B2 | Gas distribution plate and substrate treating apparatus including the same | Chemistry; Metallurgy | 8 | Active |
| US7390366B2 | Apparatus for chemical vapor deposition | Chemistry; Metallurgy | 8 | Expired |
| US7951261B2 | Plasma etching apparatus | Electricity | 8 | Active |
| US6772710B2 | Plasma enhanced chemical vapor deposition apparatus | Chemistry; Metallurgy | 8 | Expired |
| US9022714B2 | Substrate processing system and substrate transferring method | Emerging Cross-Sectional Technologies | 8 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.