Method of electrical measurement of misregistration of patterns
US6288556A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1998 |
| Grant date | Sep 11, 2001 |
| Priority date | — |
| Expiry date | Dec 3, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention allows for measurement at the same density as an actual device pattern and measures the level of registration of actual patterns with precision. In the measurement of the invention, a first exposure process is performed on a first-level pattern and a second exposure process is then performed on a second-level pattern. After that, the patterns are developed and etched, thereby forming two patterns of different shapes. Next, the resistance between terminals of a pattern which are obtained by means of etching is measured through a four-point measurement. An amount of misregistration of the first-level pattern and the second-level pattern is calculated from the measured resistance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.